A. Feature of Perovskite Evaporator
- Deposition thickness : Customer specified
- Depostion material : Organics, Metals & Oxides films
- Film thickness uniformity : ≤ ±5% on 4" substrate
- Deposition : deposition by effusion cell and plasma cell
- Throughput : up to 4" substrate × 1 sheet / batch
- Vacuum : Ultimate pressure 5.0 x 10-6 Torr
Base pressure 3.0 x 10-5 Torr
- Vacuum chamber : process chamber
evaporation source (3 or 4port)
- Control system : Manual control
- Purpose : Research and development
